Tuesday, December 12, 2006 ACCGE-15 Home
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Logo Fifteenth American Conference on
Crystal Growth and Epitaxy
          held jointly with the
11th Biennial (US) Workshop on OMVPE
          and the
3rd International Symposium on
Laser and NLO Materials


July 20 - 24, 2003
Keystone, Colorado
 

Conference
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  Conference Programs
  Special Session
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  OMVPE Proceedings
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11th Biennial Workshop on OMVPE

The eleventh biennial workshop on organometallic vapor phase epitaxy (OMVPE) will be held jointly with the 15th American Conference on Crystal Growth and Epitaxy for the first time in 2003. The workshop continues a tradition first started in Cornell in 1983, of bringing together specialists in the OMVPE field from industry, academia, and government laboratories, in an informal atmosphere, and scenic surroundings. The workshop is an excellent opportunity to present and discuss new results in the OMVPE field, as well as providing a venue for recent entrants to the field to familiarize themselves with OMVPE science and technology. The format of the conference is designed to maximize interaction both amongst OMVPE specialists, and within the context of the wider crystal growth community represented at the ACCGE. View the Advanced Program.


Topics to be covered at the workshop will include, but are not restricted to the following:

  • OMVPE growth of semiconductors, oxides, and emerging materials
  • Nitrides: growth, defects, and devices
  • Narrow gap materials and devices
  • As, P-related materials and devices
  • Nanostructured growth, quantum dots
  • Selective and nonplanar growth
  • In-situ and ex situ characterization
  • Growth and doping mechanisms
  • Simulation and modeling of the growth process
  • OMVPE chemistry
  • Epitaxy related device issues
  • Production and safety issues
Panel Discussion: 
Current Trends in the Industrial Application of OMVPE
In this informal but lively session, various trends in the application of OMVPE technology will be discussed in a panel discussion format. The discussion will primarily focus on the following areas:
  • Trends in Monitoring and Feedback Control of Epitaxial Growth
  • Trends in Gas Purity Monitoring and Control
  • Trends in OMVPE Reactors
  • Trends in OMVPE Precursors
Two industrial representatives from each category will give brief presentations on their view of important current and future issues in OMVPE technology, in order to stimulate lively discussion with the audience. Conference participants with strong views on future trends and challenges are encouraged to bring summary viewgraphs to the meeting for presentation at this session.

Session Organizer:
Dr. Egbert Woelk, Director of Marketing, Metalorganics
Shipley Company
60 Willow Street
North Andover, MA 01845
Phone (978) 689-1548
Fax (978) 557-1701
email ewoelk@shipley.com
 
Special ACCGE session on Future Directions
In addition to the contributed papers, and the above panel discussion, the ACCGE is hosting a special session on Future Directions and Requirements of Industry and Government. Some of the plenary speakers in this session should be of high interest to OMVPE attendees.
 
Program chair: 
Simon Watkins, Simon Fraser Univ., [Contact Information Removed]
 
OMVPE workshop committee:
Mike Tischler, M. Tischler & Associates, [Contact Information Removed]
Bhat, Rajaram, Corning Inc., [Contact Information Removed]
Jerry Olson, NREL, [Contact Information Removed]
Christine Wang, MIT Lincoln Labs., [Contact Information Removed]
Kurt Gaskill , NRL, [Contact Information Removed]
Robert Biefeld, Sandia, [Contact Information Removed]
 
Important dates:
Abstract Submission begins January 13, 2003
Abstract Submission ends March 14, 2003
Abstract Acceptance Notification on April 23, 2003
Late News Poster Submission ends June 6, 2003
Lodging reservations due June 6, 2003
Manuscript Submission ends July 3, 2003
Pre-registration due June 13, 2003
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