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Logo Fifteenth American Conference on
Crystal Growth and Epitaxy
          held jointly with the
11th Biennial (US) Workshop on OMVPE
          and the
3rd International Symposium on
Laser and NLO Materials


July 20 - 24, 2003
Keystone, Colorado
 

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3rd International Symposium on Laser and Nonlinear Optical Materials (ISLNOM)

This symposium is co-hosted by the 161st Committee of the Japan Society for the Promotion of Science (JSPS)

The International Symposium on Laser and Nonlinear Optical Materials (ISLNOM) provides a unique forum for discussing recent progress in the field of optical and optoelectronic materials, including growth technology, device applications, performance, and materials characterization. It is the purpose of this symposium to bring together scientists and engineers from around the World (Asia, Europe, Russia and the United States) to discuss the most exciting new developments in this field. It covers a wide range of materials, including oxides, fluorides, nitrides, II-VI and III-V compounds. In recent years other topics have also been incorporated into this symposium, including scintillator materials and industrial manufacturing issues.

The first symposium was held in Singapore in 1997 and the second in Lyon, France in 2000. The next symposium, ISLNOM-3, will be held in conjunction with the annual AACG crystal growth conference and the OMVPE-11 (Keystone, Colorado in 2003). Since these symposiums emphasize the most recent advances made in crystal growth technology, both for bulk optical and optoelectronic devices and substrates, its coupling with the AACGE conference, (in which many related topics in crystal growth and epitaxy are covered), as well as the OMVPE workshop (which covers an important semiconductor laser manufacturing technology) gives added benefit to researchers attending any of these meetings

The proceedings will be published in the J Optical Materials. Please submit 3 hard copies of the manuscript to the proceedings editors at the Symposium by July 21,2003, in addition to submitting an electronic version to Georges Boulon at [Contact Information Removed]. (View Advanced Program)

Topics to be covered at the symposium will include, but are not restricted to the following:

  • Science and Technology of crystal growth of optical materials
  • Bulk crystals, thin films, fibers, shaped crystals
  • Crystal characterization, defects and devices
  • Oxide, fluoride and nitride solid state lasers
  • Semiconductor lasers
  • High power lasers
  • UV/Blue Lasers
  • Nd, Yb, and Cr doped IR Lasers
  • Ceramic lasers
  • Organic optical materials
  • Nonlinear materials
  • Second Order nonlinear borates and KTA
  • Third order nonlinear materials
  • Waveguide structures
  • Quasi-phase matching
  • Photorefractive and magneto-optic materials
  • Scintillators
  • Manufacturing issues concerning crystal and device production
Plenary Speakers:
Peter Moulton, Q-Peak, "History of Ti:Al2O3 and Doped UV lasers" and
Paul Lecoq, CERN, "New Scintillator Crystals"
 
Invited Speakers:
Speaker Organization Presentation Title
G. Aka ENSCP  Ca4ReO(BO3)3 (Re=Gd,Y,Nd) Crystals for CW Green and Blue Microchip Laser Generation: From Crystal Growth to Laser and Non Linear Optical Properties
N. P. Barnes  NASA Langley Research Center Compositionally Tuned Lasers For Remote Sensing
B. Boulanger University J, Fourier Sphere and Cylinder: Two suitable Geometries in Nonlinear Optics for Crystal Characterization and tunable parametric devices
G. Boulon Claude Bernard Lyon 1 University Advances of Yb3+ Doped Crystals for Laser Applications
R. Byer Stanford University Recent Advances in Solid State Lasers
B. H. T. Chai Crystal Photonics Recent Progress of Scintillators
C. Chen Chinese Academy of Sciences Growth and Vacuum-UV Harmonic Generation in KBBF Crystals
C. Denman AFRL/DELO Generation of 20W sodium yellow for adaptive optic telescope applications
M. M. Fejer Stanford University Recent Progress in Quasi-Phase Matched LiNbO3 & LiTaO3
G. Grabosch & L. Parthier Schot-Technology Business Unit CaF2 for DUV Lithography applications
G. Huber, E. Heumann, and Hanno Scheife University of Hamburg Advances in Up-conversion Lasers Based on Er3+ and Pr3+
M. Imaeda NGK Insulators, LTD Periodically Poled MgO:LiNbO3 Ridge-type Waveguide and Application for Blue-Green SHG Lasers
Y. Kawakami & S. Fujita Kyoto University Emission Mechanism in InGaN/GaN-Based Quantum Well Structures
E. Moses LLNL The National Ignition Facility: The World's Largest Laser
Y. Mori and T. Sasaki Osaka University Development of Optical Nonlinear Crystals for UV Generation at Osaka University
M. Nikl Czech Institute of Physics Charge Transfer Luminescence in Yb+3 Containing Compounds
N. Sarukura and T. Fukuda Institute for Molecular Science, Tohoku University Application of Various Fluoride Crystals as Ultraviolet Tunable Lasers Media and Optical Materials for F2 Laser Lithography
K. Schaffers LLNL High Power Yb:S-FAP Lasers
P. Schunemann BEA System New Mid-IR Nonlinear Crystals
I. Sorokina Techische University Wien Cr+2 Doped Materials for Lasers & Nonlinear Optics
K. Ueda University of Electrocommunication Scalable and High Performance Ceramic Lasers
R. Wallenstein University Kaiserslautern GB Lasers for display applications

 

Conference Chairs:
Prof. Robert S. Feigelson, Stanford University, USA
Prof. Tsuguo Fukuda, Chairman of 161st Committee, JSPS; and Professor, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
 
Conference Secretariat:
A. Yoshikawa: Japan [Contact Information Removed]
M. Imaeda: Japan [Contact Information Removed]
 
Organization Chair:
Prof. Robert S. Feigelson
Geballe Laboratory for Advanced Materials
Stanford University
Stanford, CA 94305-4045
USA
PH: 650-723-4007
FAX: 650-723-3752
e-mail: [Contact Information Removed]
 
ISLNOM-3 Program Committee
M.M. Fejer (USA) [Contact Information Removed]
B. Chai (USA)[Contact Information Removed]
G. Boulon (France)[Contact Information Removed]
N. Sarukura (Japan)[Contact Information Removed]
Y. Mori (Japan)[Contact Information Removed]
A. Yoshikawa (Japan) [Contact Information Removed]
S. Payne (USA) [Contact Information Removed]
Y. Mori (Japan) [Contact Information Removed]
P. Schunemann (USA)[Contact Information Removed]
 
Publication Committee
Georges Boulon - Claude Bernard Lyon 1 University [Contact Information Removed]
Satoshi Uda - Tohoku University [Contact Information Removed]
 
Important dates:
Abstract Submission begins January 13, 2003
Abstract Submission ends March 14, 2003
Abstract Acceptance Notification on April 23, 2003
Late News Poster Submission ends June 6, 2003
Lodging reservations due June 6, 2003
Pre-registration due June 13, 2003
 
International Advisory Committee:
B. Chai: USA [Contact Information Removed]
R. Feigelson: USA [Contact Information Removed]
T. Sasaki Japan [Contact Information Removed]
G. Boulon: France[Contact Information Removed]
D. Vivien: France[Contact Information Removed]
H. Gallagher: England [Contact Information Removed]
G. Huber: Germany[Contact Information Removed]
M. Nikl: Czech Republic [Contact Information Removed]
C. Chen: China [Contact Information Removed]
T. Fukuda: Japan [Contact Information Removed]
S. Baldochi: Brazil [Contact Information Removed]
M. Imaeda: Japan[Contact Information Removed]
F. Kuznetsov: Russia [Contact Information Removed]
S. Uda: Japan [Contact Information Removed]
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