This course will enable students, newcomers, those changing fields, and all others interested to learn about the latest developments at the forefront of bulk crystal and epitaxial thin film growth. Tutorial reviews on the following topics will be presented by experts in the field and the forum will provide ample opportunity for discussion.

Short Course Program

Saturday, July 31    2:00 - 5:20 pm

Bulk Crystal Growth    (Dave Brandle, Lucent Technologies, Chair)

2:00 pm - "Oxide Substrate Growth"
                        George Berkstresser, Lucent Technologies Bell Labs
3:00 pm - "Novel Substrates (SiC)"
                        Dieter H. Hofmann, Univeristat Erlangen-Nürnberg, Germany
4:00 pm - BREAK
4:20 pm - "Solid Solution III-V Substrates"
                        Bill Bonner, Crystallod
 

Oxide Thin Films    (Darrell Schlom, Penn State University, Chair)

9:00 am - "Liquid Delivery for Oxide Growth"
                        Jeffrey Roeder, Advanced Technology Materials, Inc.
10:00 am - "Off-Axis Sputtering of Oxides"
                        Chang-Boem Eom, Duke University
11:00 am - BREAK
11:20 am - "Wafer Bonding of Oxides"
                        Marin Alexe, Max Planck Institute, Halle, Germany
 

Semiconductor Thin Films    (Tom Kuech, University of Wisconsin-Madison, Chair)

2:00 pm - "Epitaxial Growth of GaN-based Semiconductor Materials and Devices"
                        Steven DenBaars, University of California, Santa Barbara
3:30 pm - BREAK
3:50 pm - "In Situ and/or Optical Monitors of Growth"
                        William G. Breiland, Sandia National Labs
 

For further registration information and the registration forms, go to:
http://www.aml.arizona.edu/aacg/conferences/accge11/reg_forms.html